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Biography
(只提供英文版)

  • Professor in Department of Mechanical and Automation Engineering at The Chinese University of Hong Kong
  • Research in recent years focuses on the development of ultrafast laser-based microfabrication and micro-additive manufacturing processes
  • SRFS project — aims to address the major challenges in high-resolution photopolymerization processes, including resolution, throughput, cost, and reproducibility through two-photon lithography (TPL); and to enable large-scale applications of TPL and new functions such as optical part repair and modification for the first time. This project will develop a high-speed closed-loop projection-based TPL platform through the development of an optical diffraction tomography module to monitor the fabrication process in situ. Based on the new capabilities, this project will design, fabricate, and characterize large-scale optical and mechanical metamaterial structures and photonic devices with sub-50 nm resolution, generating significant impact in the nanomanufacturing and nanotechnology industry.
  • Awards and Honours:
    • RGC Senior Research Fellow (2025)
    • Bank of China (Hong Kong) Science and Technology Innovation Prize (Advanced Manufacturing) (2024)
    • China’s Top 10 Optical Breakthroughs in 2023 Award (Fundamental Research) (2024)
    • Winner of the Falling Walls 2023 "Science Breakthroughs of the Year" - Engineering & Technology (2023)
    • R&D 100 Award for One of 100 Best New Technical Products of the Year - Digital Holography-based 3-D Nano-Builder (2018)

Project Title
(只提供英文版)

  • Closed-loop High-throughput Super-resolution Two-photon Lithography

赞词

陈世祈是香港中文大学机械与自动化工程学系教授,专注于精密工程研究。本研究旨在解决纳米级3D打印(又称双光子光刻技术,TPL)领域长期存在的挑战,并首次实现TPL的大规模应用和新功能,包括光学部件的修复和改造。

 

TPL是一种重要的增材制造方法,其特征尺寸约为150纳米。然而,最先进的商用TPL系统一直受到速度缓慢的困扰,局限于学术研究。为了实现TPL的实际应用,必须开发能够同时提高解析度、速率和良率的新方法。

 

本计划将开发一个基于高速闭环投影的TPL平台,该平台将透过开发光学衍射层析成像(ODT)模块来即时监测制造过程。快速的ODT系统将实现逐脉冲折射率监测及精确的雷射剂量控制。为了进一步提高分辨率,这项计划将投影TPL与周边光抑制的概念相结合,透过将投影雷射焦点与光抑制图案迭加,可产生多达10,000个雷射焦点(分辨率为50纳米),从而实现高速超分辨TPL。基于这些新功能,这项计划将设计、制造和表征分辨率低于50纳米的大规模光学和机械超材料结构及光子装置。

 

新的TPL平台将对纳米制造和纳米技术产业产生重大影响。此外,ODT模块可以在不同的光聚合过程和无标记3D生物成像中找到更广泛的应用。

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